Mr. Tsutomu ISHIKAWA
Kyushu University, Department of Materials Science and Engineering, Hakozaki
Fukuoka 812-8581, Japan
Phone: +81(92) 6423682; Fax:+81 (92) 6320434
E-mail: ishikawa@masuda.zaiko.kyushu-u.ac.jp
Mr. Tsutomu Ishikawa is now dealing with the problems of hydrogen in metal nitride thin films, especially the effects of hydrogen ion implantation on the electrical properties of copper nitride thin films.